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Study of SiO2 Etching using Plasma Diagnostics

Abstract

Rami Onkar

Plasma is described as semi-neutral plasma of charged, unbiased particles that exhibits collective behaviour. The distinctive features that distinguish plasma from other release characteristics are applied in many contemporary and research sectors, such as regulating the component particles for specific uses.

Isenção de responsabilidade: Este resumo foi traduzido usando ferramentas de inteligência artificial e ainda não foi revisado ou verificado

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